Tantalum Sputtering Target – Disc
Tsanangudzo
Tantalum sputtering target inonyanya kushandiswa muindasitiri yesemiconductor uye indasitiri yeoptical coating.Isu tinogadzira zvakasiyana-siyana zvakatemwa zve tantalum sputtering zvibodzwa pachikumbiro chevatengi kubva kune semiconductor indasitiri uye yekuona indasitiri kuburikidza ne vacuum EB choto chekunyungudutsa nzira.Nekungwarira nzira yakasarudzika yekutenderedza, kuburikidza nekuomesesa kurapwa uye chaiyo annealing tembiricha uye nguva, isu tinogadzira zvimiro zvakasiyana zvetantalum sputtering tarisiro senge disc targets, rectangular targets uye rotary targets.Uyezve, isu tinovimbisa kuti tantalum kuchena kuri pakati pe99.95% kusvika 99.99% kana kupfuura;saizi yezviyo iri pasi pe100um, flatness iri pazasi 0.2mm uye Surface Roughness iri pazasi Ra.1.6μm.Saizi inogona kugadzirwa nezvinodiwa nevatengi.Isu tinodzora zvigadzirwa zvedu zvemhando kuburikidza neyakasvibirira sosi kusvika iyo yese mutsara wekugadzira uye pakupedzisira kuendesa kune vatengi vedu kuitira kuti tive nechokwadi chekuti unotenga zvigadzirwa zvedu zvakagadzikana uye zvakafanana mhando imwe neimwe.
Tiri kuedza nepatinogona napo kuvandudza hunyanzvi hwedu, kuwedzera kunaka kwechigadzirwa, kuwedzera mwero wekushandiswa kwechigadzirwa, kudzikisira mitengo, kuvandudza sevhisi yedu kupa vatengi vedu zvigadzirwa zvemhando yepamusoro asi mutengo wakaderera wekutenga.Paunenge watisarudza, iwe unozowana yedu yakagadzikana yemhando yepamusoro zvigadzirwa, mutengo unokwikwidza kupfuura vamwe vatengesi uye masevhisi edu anoenderana nenguva, akanyanya kushanda.
Isu tinogadzira R05200, R05400 zvibodzwa zvinosangana neASTM B708 yakajairwa uye isu tinokwanisa kuita zvibodzwa zvinoenderana nedhirowa yako yakapihwa.Tichitora mabhenefiti emhando yedu yemhando yepamusoro tantalum ingots, midziyo yepamberi, tekinoroji yehunyanzvi, timu yehunyanzvi, isu takagadzirisa zvaunoda sputtering zvinangwa.Unogona kutiudza zvese zvaunoda uye isu takatsaurira mukugadzira pane zvaunoda.
Type uye saizi:
ASTM B708 Standard Tantalum Sputtering Target , 99.95% 3N5 - 99.99% 4N Kuchena , Disc Target
Chemical Compositions:
Ongororo Yakajairika:Ta 99.95% 3N5 - 99.99%(4N)
Metallic tsvina, ppm max nekurema
| Element | Al | Au | Ag | Bi | B | Ca | Cl | Cd | Co | Cr | Cu | Fe |
| Content | 0.2 | 1.0 | 1.0 | 1.0 | 0.1 | 0.1 | 1.0 | 1.0 | 0.05 | 0.25 | 0.75 | 0.4 |
| Element | Ga | Ge | Hf | K | Li | Mg | Na | Mo | Mn | Nb | Ni | P |
| Content | 1.0 | 1.0 | 1.0 | 0.05 | 0.1 | 0.1 | 0.1 | 5.0 | 0.1 | 75 | 0.25 | 1.0 |
| Element | Pb | S | Si | Sn | Th | Ti | V | W | Zn | Zr | Y | U |
| Content | 1.0 | 0.2 | 0.2 | 0.1 | 0.0 | 1.0 | 0.2 | 70.0 | 1.0 | 0.2 | 1.0 | 0.005 |
Non-Metallic tsvina, ppm max nekurema
| Element | N | H | O | C |
| Content | 100 | 15 | 150 | 100 |
Chiyero: Tantalum
Saizi yezviyo: Saizi chaiyo <100μm Saizi yezviyo
Imwe saizi yezviyo inowanikwa pakukumbira
Flatness: ≤0.2mm
Kukasharara Kwepamusoro:< Ra 1.6μm
Musoro: Yakakwenenzverwa
Applications
Coating zvinhu zve semiconductors, optics
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